E5610

Defect Review SEM supports next-generation photomasks

The E5610 is a MASK DR-SEM^(∗1) for reviewing and classifying ultra-small defects in photomask and blanks.
Inheriting the highly stable, full automatic image capture technology developed by Advantest for its acclaimed MVM-SEM^®(∗2), the E5610 easily imports defect location data from Mask Inspection System and automatically images the locations.In addition, it features a newly developed beam tilt mechanism that enables scanning at oblique angles, and an EDS^(∗3) module that performs elemental analysis.
With its high-accuracy, high-throughput defect review capability, the E5610 is expected to contribute to next-generation photomask production quality improvement and shorter manufacturing TAT.

 

*1: DR-SEM = Defect Review - Scanning Electron Microscope

*2: EDS = Energy Dispersive X-ray Spectrometry